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Quartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
Department of Chemistry Applications and Life Science, Yokohama National University, Hodogaya, Yokohama, Japan
Department of Chemistry Applications and Life Science, Yokohama National University, Hodogaya, Yokohama, Japan
Department of Chemistry Applications and Life Science, Yokohama National University, Hodogaya, Yokohama, Japan
National Institutes of Advanced Science and Technology, Umezono, Tsukuba, Japan
Minimal Fab Development Association, Umezono, Tsukuba, Japan
Minimal Fab Development Association, Umezono, Tsukuba, Japan
- 1 Department of Chemistry Applications and Life Science, Yokohama National University, Hodogaya, Yokohama, Japan
- 2 Department of Chemistry Applications and Life Science, Yokohama National University, Hodogaya, Yokohama, Japan
- 3 Department of Chemistry Applications and Life Science, Yokohama National University, Hodogaya, Yokohama, Japan
- 4 National Institutes of Advanced Science and Technology, Umezono, Tsukuba, Japan
- 5 Minimal Fab Development Association, Umezono, Tsukuba, Japan
- 6 Minimal Fab Development Association, Umezono, Tsukuba, Japan
Advances in Chemical Engineering and Science·Volume 10 (2020)·Pages 190–200·Published 13 May 2020·DOI10.4236/aces.2020.103014
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Abstract
A dichlorosilane gas and a trichlorosilane gas in ambient hydrogen were evaluated to show their different gas flow motions in a slim vertical cold wall chemical vapor deposition reactor for the Minimal Fab system. This evaluation was performed for improving and controlling the film qualities and the productivities, using two quartz crystal microbalances (QCM) installed at the inlet and exhaust of the chamber by taking into account that the QCM frequency corresponds to the real time changes in the gas properties. Typically, the time period approaching from the inlet to the exhaust was shorter for the trichlorosilane gas than that for the dichlorosilane gas. The trichlorosilane gas was shown to move like plug flow, while the dichlorosilane gas seemed to be well mixed in the entire chamber.
KeywordsMinimal FabChemical Vapor Deposition ReactorQuartz Crystal MicrobalanceSilicon Epitaxial GrowthTrichlorosilaneDichlorosilane
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