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Molecular Adsorption and Desorption Behavior on Silicon Surface in a Complex Ambient Atmosphere Containing Vapors of Diethylphthalate, Acetic Acid and Water
Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
- 1 Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
- 2 Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
- 3 Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
- 4 Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan
American Journal of Analytical Chemistry·Volume 04 (2013)·Pages 80–85·Published 17 July 2013·DOI10.4236/ajac.2013.47A011
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Abstract
Using a complex ambient atmosphere containing vapors of an organic compound, acid and water, the molecular adsorp tion and desorption behavior on a silicon surface was studied using the in-situ measurement of a quartz crystal micro balance linked to the rate theory. Because the behavior of diethylphthalate (DEP) could be reproduced assuming a sin gle-component system, acetic acid (ACA) and DEP are concluded to separately exist in the water film and at the water film surface, respectively. This conclusion was obtained from both the adsorption and desorption behaviors. The proc ess developed in this study is useful for determining the layer in which chemical compounds are present.
KeywordsSilicon SurfaceDiethylphthalateAcetic AcidPhysisorptionDesorption
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