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Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
- 1 Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
- 2 Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
- 3 Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
Journal of Crystallization Process and Technology·Volume 04 (2014)·Pages 20–26·Published 2 January 2014·DOI10.4236/jcpt.2014.41003
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Abstract
Plasma-assisted chemical vapor deposition (PCVD) at pressure as low as 3 mtorr using titanium-tetra-isopro poxide (TTIP) and oxygen mixed gas plasma generated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at temperature under 40°C. Plasma optical emission spectroscopy and FTIR indicated that density of OH group in the amorphous layer was related to the density of OH or H 2 O in the plasma and the species was formed on electrode to induce the RF-power. Hydrophilicity on the layer was dependent on the density of chemisorbed OH , but was degraded by the excess OH . The PCVD-TiO x coating was demonstrated on polyethylene terephthalate and showed good hydrophilic property with the contact angle of water about 5°.
KeywordsPCVDAmorphous Titanium-OxideFTIRHydroxylHydrophilicity
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