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Dependence of Plasma Parameters on Plate Separation and Filament Location in a Double Plasma Device
Centre of Plasma Physics—Institute for Plasma Research, Tepesia, India
Centre of Plasma Physics—Institute for Plasma Research, Tepesia, India
Centre of Plasma Physics—Institute for Plasma Research, Tepesia, India
ITER-India, Institute for Plasma Research, Gandhinagar, Gujarat, India
- 1 Centre of Plasma Physics—Institute for Plasma Research, Tepesia, India
- 2 Centre of Plasma Physics—Institute for Plasma Research, Tepesia, India
- 3 Centre of Plasma Physics—Institute for Plasma Research, Tepesia, India
- 4 ITER-India, Institute for Plasma Research, Gandhinagar, Gujarat, India
Journal of Modern Physics·Volume 03 (2012)·Pages 1002–1008·Published 24 September 2012·DOI10.4236/jmp.2012.39130
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Abstract
A pair of stainless steel (ss) plates separates the source and target regions of a double plasma device. Two sets of tungsten filaments, placed at different distances from the ss plates, are then used to produce plasma alternately and the plasma parameters in the source and target regions for different discharge voltage, discharge current and plate separation are measured using Langmuir probes. It is found that plasma density and electron temperature are considerably affected and respond differently to changes in the plate separations and the position of the filaments.
KeywordsFilament LocationPlasma ParametersDouble Plasma Device
- I. Alexeff and W. D. Jones, “Varying Plasma Electron Temperature in Discharge Tubes by a Simple Auxiliary Electrode,” Applied Physics Letters, Vol. 9, No. 2, 1966, pp. 77-79. doi:10.1063/1.1754650
- K. R. MacKenzie, R. J. Taylor, D. Cohn, E. Ault and H. Ikezi, “Plasma Electron Heating by Absorption of Cold Electrons,” Applied Physics Letters, Vol. 18, No. 12, 1971, pp. 529-530. doi:10.1063/1.1653525
- N. Hershkowitz, M.-H. Cho and J. Pruski, “Mechanical Variation of Plasma Potential, Electron Temperature and Plasma Density,” Plasma Sources Science and Technology, Vol. 1, No. 2, 1992, p. 87. doi:10.1088/0963-0252/1/2/003
- N. Sato, S. Lizuka, T. Koizumi and T. Takada, “Electron-Temperature Control by Movable Pins Installed in a Hollow Cathode for Discharge Plasmas,” Applied Physics Letters, Vol. 62, No. 6, 1993, pp. 567-569. doi:10.1063/1.108913
- K. Kato, S. Lizuka and N. Sato, “Electron-Temperature Control for Plasmas Passing through a Negatively Biased Grid,” Applied Physics Letters, Vol. 65, No. 7, 1994, pp. 816-818. doi:10.1063/1.112240
- K. Kato, T. Shimizu, S. Lizuka and N. Sato, “Electron Temperature Control by Varying Size of Slits Made in a Grid,” Applied Physics Letters, Vol. 76, No. 5, 2000, pp. 547-459. doi:10.1063/1.125814
- K. N. Leung, R. D. Collier, L. B. Marshall, T. N. Gallaher, W. H. Ingham, R. E. Kribel and G. R. Taylor, “Characteristics of a Multidipole Ion Source,” Review of Scientific Instruments, Vol. 49, 1978, p. 321.
- M. K. Mishra, A. Phukan, M. Chakraborty and K. S. Goswami, “Role of High Energetic Electrons in Controlling Diffused Plasma Parameters in a Double Plasma Device,” Physics Letters A, Vol. 365, No. 1-2, 2007, pp. 135-139. doi:10.1016/j.physleta.2006.12.078
- M. K. Mishra, A. Phukan and M. Chakraborty, “Effect of Cathode and Anode Voltage on an Ion Sheath Thickness in a Magnetically Confined Diffusion Plasma,” Contributions to Plasma Physics, Vol. 47, No. 10, 2007, pp. 677- 682. doi:10.1002/ctpp.200710077
- E. Speth, H. D. Falter, P. Franzen, U. Fantz, M. Bandy-opadhyay, et al., “Overview of the RF Source Development Programme at IPP Garching,” Nuclear Fusion, Vol. 46, No. 6, 2006, p. S220. doi:10.1088/0029-5515/46/6/S03
- M. Bacal, J. Bruneteau, and P. Devynck, “Method for Extracting Volume Produced Negative Ions,” Review of Scientific Instruments, Vol. 59, No. 10, 1988, pp. 2152- 2157. doi:10.1063/1.1139978