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Probe and Emission Spectrometry Diagnostics in Hollow Cathode Magnetron
Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
- 1 Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
- 2 Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
- 3 Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
- 4 Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
- 5 Department of Physics, Faculty of Electronics, Moscow State Forest University, Mytischi, Russia
Journal of Modern Physics·Volume 03 (2012)·Pages 1494–1502·Published 30 October 2012·DOI10.4236/jmp.2012.310185
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Abstract
This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means of hollow cathode magnetron. Langmuir probe, optical emission spectroscopy measurements were used to study a mechanism for the production of excited argon and copper atoms and ions. The kinetic processes of excitation were considered and the main processes were determined using results of measurements. The pressure range is 0.5 - 10 mTorr with 1- 5 kW discharge power. Plasma parameters such as electron densities and temperatures, electron energy distribution function, plasma space and floating potentials as a function of the position, pressure and power in the growth chamber were measured. The plasma density is up to 1012 cm?3 at 20 cm from the magnetron for 10 mTorr.
KeywordsHollow Cathode MagnetronIonized Physical Vapor Deposition
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