Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn<sub>2</sub>O<sub>4</sub> Thin Films on Au/Polyimide Flexible Substrates — Oak Academic Publishing
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Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn<sub>2</sub>O<sub>4</sub> Thin Films on Au/Polyimide Flexible Substrates
Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, India
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Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, India.
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Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, India.
1 Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, India
2 Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, India.
3 Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, India.
LiMn 2 O 4 thin films are deposited on gold coated polyimide flexible substrates using RF magnetron sputtering technique maintained at a moderate substrate temperature of 300 ℃ . The films exhibited characteristic peaks with predominant (111) orientation representing cubic spinel structure of Fd3 m symmetry with an evaluated lattice parameter of 8.199 ? . The surface topography of films exhibited pyramidal shaped grains oriented vertical to the substrate surface with root mean square surface roughness of 90 nm. The Pt/LiMn 2 O 4 electrochemical cell in aqueous region exhibited two step de-insertion and insertion kinetics of Li ion during oxidation and reduction reaction with an initial discharge capacity of 36 μAh ? cm _ 2 ? μm _ 1 .
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