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Palladium Ultra Thin Layer Profiles Evaluation by Evanescent Light
Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
- 1 Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
- 2 Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
- 3 Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
- 4 Holon Institute of Technology, Electrical Engineering Department, Photonics Laboratory, Holon, Israel
Materials Sciences and Applications·Volume 04 (2013)·Pages 572–577·Published 3 September 2013·DOI10.4236/msa.2013.49070
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Abstract
Nanometric profiles of sputtered ultra-thin Pd layers with thicknesses in the range 1 - 10 nm were investigated by cap turing the leaking evanescent light from optical waveguides. The Pd films were deposited by sputtering on glass sub stratesalso servingas light waveguides. Calibrating the thickness values for the ultra-thin Pd films obtained from the sputtering rate combined with the DELI estimation technique, gave detailed 1Dand 3D morphological nanometric pro files of the deposited layers.
KeywordsPd Nanometer LayersEvanescent Field
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