Tungsten carbide films (W-C films) were fabricated on silicon substrates by using the filtered pulse arc deposition (FPAD) method. Two types of cemented tungsten carbide (WC) were used as cathode, one containing Co and the other Ti, which were used as binders for forming the cathode shape. The films were fabricated by varying the pulse arc current and substrate bias voltage. The discharge, deposition and film properties were investigated under these deposition conditions. The cathode wear amount when using WC-Co (WC cathode containing Co) was found to be smaller than that measured when WC-Ti (WC cathode containing Ti) was used. The W-C film thickness was approximately 30 - 40 nm under all conditions, except when the pulse arc current was 50 A and the film thickness, was approximately 10 nm. Compared to the WC-Ti, the consumption of cathode material is suppressed in the WC-Co, indicating that the efficiency for film preparation of the latter is good. From the X-ray diffraction analysis, the crystalline phase of W-C films fabricated using WC-Co and WC-Ti were observed as W 2 C and WC 1-x , respectively, indicating that different crystalline phases could be fabricated using different cathodes. From the X-ray photoelectron spectroscopy analysis, the oxidation layer formed by air exposure was observed to exclusively exist on the W-C film surface. Moreover, almost all oxygen in the oxidation layer bonded with tungsten.
Radic, N., Grzeta, B., Milat, O., Ivkov, J. and Stubicar, M. (1998) Tungsten-Carbon Films Prepared by Reactive Sputtering from Argon-Benzene Discharges. Thin Solid Films, 320, 192-197. https://doi.org/10.1016/S0040-6090(97)00758-X
Voevodin, A.A., O’Neill, J.P., Prasad, S.V. and Zabinski, J.S. (1999) Nanocrystalline WC and WC/a-C Composite Coatings Produced from Intersected Plasma Fluxes at Low Deposition Temperatures. Journal of Vacuum and Technology A, 17, 986-992. https://doi.org/10.1116/1.581674
Esteve, J., Zambrano, G., Rincon, C., Martinez, E., Galindo, H. and Prieto, P. (2000) Mechanical and Tribological Properties of Tungsten Carbide Sputtered Coatings. Thin Solid Films, 373, 282-286. https://doi.org/10.1016/S0040-6090(00)01108-1
Tavasanoglu, T., Begum, C., Alkan, M. and Yucel, O. (2013) Deposition and Characterization of Tungsten Carbide Thin Films by DC Magnetron Sputtering for Wear-Resistant Applications. The Journal of The Minerals, 65, 562-566.
Mrabet, S.E., Abad, M.D., Lopez-Cartes, C., Martinez-Martinez, D. and Sanchez- Lopez, J.C. (2009) Thermal Evolution of WC/C Nanostructured Coatings by Raman and In Situ XRD Analysis. Plasma Processes and Polymers, 6, S444-S449. https://doi.org/10.1002/ppap.200931004
Utsumi, T., Oka, Y., Fujiwara, E. and Yatsuzuka, M. (2007) Effect of a Hard Supra-Thick Interlayer on Adhesion of DLC Film Prepared with PBIID Process. Nuclear Instruments and Methods in Physics Research B, 257, 706-709. https://doi.org/10.1016/j.nimb.2007.01.127
Pujada, B.R., Tichelaar, F.D. and Janssen, G.C.A.M. (2008) Hardness of and Stress in Tungsten Carbide-Diamond Like Carbon Multilayer Coatings. Surface and Coatings Technology, 203, 562-565. https://doi.org/10.1016/j.surfcoat.2008.05.051
Yatsuzuka, M., Oka, Y., Tomita, A., Murata, N. and Hirota, M. (2007) Wear Properties of DLC and Plasma Sprayed WC Structure Coating. Solid State Phenomena, 127, 245-250. https://doi.org/10.4028/www.scientific.net/SSP.127.245
Hirata, A., Zheng, H. and Yoshikawa, M. (1998) Adhesion Properties of CVD Diamond Film on Binder-Less Sintered Tungsten Carbide Prepared by the Spark Sintering Process. Diamond and Related Materials, 7, 1669-1674. https://doi.org/10.1016/S0925-9635(98)00242-8
Tang, X., Haubner, R., Lux, B. and Kieffer, B. (1995) Preparation of Ultrafine CVD WC Powders Deposited from WCl6 Gas Mixtures. Journal de Physique Ⅳ, 5, C5-1013-C5-1020. https://doi.org/10.1051/jphyscol:19955119
Nazon, J., Herbst, M., Marco de Lucas, M.C., Bourgeois, S. and Domenichini, B. (2015) WC-Based Thin Films Obtained by Reactive Radio-Frequency Magnetron Sputtering Using W target and Methane Gas. Thin Solid Films, 591, 119-125. https://doi.org/10.1016/j.tsf.2015.08.035
Zellner, M.B. and Chen, J.G. (2004) Synthesis, Characterization and Surface Reactivity of Tungsten Carbide (WC) PVD Films. Surface Science, 569, 89-98. https://doi.org/10.1016/j.susc.2004.07.029
Rincon, C., Zambrano, G., Carvajal, A., Prieto, P., Galindo, H., Martinez, E., Lousa, A. and Esteve, J. (2001) Tungsten Carbide/Diamond-Like Carbon Multilayer Coatings on Steel for Tribological Applications. Surface and Coatings Technology, 148, 277-283. https://doi.org/10.1016/S0257-8972(01)01360-3
Abdelouahdi, K., Sant, C., Legrand-Buscema, C., Aubert, P., Perriere, J., Renou, G. and Houdy, P. (2006) Microstructural and Mechanical Investigations of Tungsten Carbide Films Deposited by Reactive RF Sputtering. Surface and Coatings Technology, 200, 6469-6473. https://doi.org/10.1016/j.surfcoat.2005.11.015
Beadle, K.A., Gupta, R., Mathew, A., Chen, J.G. and Willis, B.G. (2008) Chemical Vapor Deposition of Phase-Rich WC Thin Films on Silicon and Carbon Substrates. Thin Solid Films, 516, 3847-3854. https://doi.org/10.1016/j.tsf.2007.06.170
Kelly, C.M., Garg, D. and Dyer, P.N. (1992) Kinetics of Chemical Vapor Deposition of Tungsten Carbide. Thin Solid Films, 219, 103-108. https://doi.org/10.1016/0040-6090(92)90729-U
Anders, A. (2002) Energetic Deposition Using Filtered Cathodic Arc Plasmas. Vacuum, 67, 673-686. https://doi.org/10.1016/S0042-207X(02)00260-9
Hakovirta, M., Tiainen, V.-M. and Pekko, P. (1999) Review: Techniques for Filtering Graphite Macroparticles in the Cathodic Vacuum Arc Deposition of Tetrahedral Amorphous Carbon Films. Diamond and Related Materials, 8, 1183-1192. https://doi.org/10.1016/S0925-9635(99)00111-9
Takikawa, H. and Tanoue, H. (2007) Review of Cathodic Arc Deposition for Preparing Droplet-Free Thin Films. IEEE Transactions on Plasma Science, 35, 992-999. https://doi.org/10.1109/TPS.2007.897907
Buschel, M. and Grimm, W. (2001) Influence of the Pulsing of the Current of a Vacuum Arc on Rate and Droplets. Surface and Coatings Technology, 142-144, 665-668. https://doi.org/10.1016/S0257-8972(01)01254-3
Martin, P.J. and Bendavid, A. (2001) Invited Review: Review of the Filtered Vacuum Arc Process and Materials Deposition. Thin Solid Films, 394, 1-15. https://doi.org/10.1016/S0040-6090(01)01169-5
Boxman, R.L., Zhitomirsky, V., Alterkop, B., Gidalevich, E., Beilis, I., Keidar, M. and Goldsmith, S. (1996) Recent Progress in Filtered Vacuum Arc Deposition. Surface and Coatings Technology, 86-87, 243-253. https://doi.org/10.1016/S0257-8972(96)03023-X
Leng, Y.X., Chen, J.Y., Yang, P., Sun, H., Wan, G.J. and Huang, N. (2003) Mechanical Properties and Thermomechanical Stability of Diamond-Like Carbon Films Synthesized by Pulsed Vacuum Arc Plasma Deposition. Surface and Coating Technology, 173, 67-73. https://doi.org/10.1016/S0257-8972(03)00442-0
Kwok, S.C.H., Zhang, W., Wan, G.J., McKenzie, D.R., Bilek, M.M.M. and Chu, P.K. (2007) Hemocompatibility and Anti-Bacterial Properties of Silver Doped Diamond-Like Carbon Prepared by Pulsed Filtered Cathodic Vacuum Arc Deposition. Diamond and Related Materials, 16, 1353-1360. https://doi.org/10.1016/j.diamond.2006.11.001
Chun, S.-Y. and Chayahara, A. (2000) Pulsed Vacuum Arc Deposition of Multilayers in the Nanometer Range. Surface and Coatings Technology, 132, 217-221. https://doi.org/10.1016/S0257-8972(00)00850-1
Sanders, D.M. and Anders, A. (2000) Review of Cathodic Arc Deposition Technology at the Start of the New Millennium. Surface and Coatings Technology, 133-134, 78-90. https://doi.org/10.1016/S0257-8972(00)00879-3
Anders, A., Pasaja, N., Lim, S.H.N., Petersen, T.C. and Keast, V.J. (2007) Plasma Biasing to Control the Growth Conditions of Diamond-Like Carbon. Surface and Coatings Technology, 201, 4628-4632. https://doi.org/10.1016/j.surfcoat.2006.09.313
Anders, A. (1999) Approaches to Rid Cathodic Arc Plasmas of Macro and Nanoparticles: A Review. Surface and Coatings Technology, 120-121, 319-330. https://doi.org/10.1016/S0257-8972(99)00460-0
Shi-jin, L., Banno, T., Mera, Y., Kitajima, M., Ishioka, K., Harada, Y., Kitajima, Y., Shin, S. and Maeda, K. (2008) The Role of a Graphitic Surface Layer in Electron-Stimulated Ordering in Tetrahedral Amorphous Carbon Films. New Carbon Materials, 23, 241-244. https://doi.org/10.1016/S1872-5805(08)60026-8