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Tribological Behavior of Binary B-C Films Deposited by Sputtering-PBII Hybrid System
USTRON Co. Ltd., Tokyo, Japan
Mechanical Systems Engineering Major, Graduate School of Engineering, Nippon Institute of Technology, Saitama, Japan
Department of Applied Chemistry, Faculty of Fundamental Engineering, Nippon Institute of Technology, Saitama, Japan
- 1 USTRON Co. Ltd., Tokyo, Japan
- 2 Mechanical Systems Engineering Major, Graduate School of Engineering, Nippon Institute of Technology, Saitama, Japan
- 3 Department of Applied Chemistry, Faculty of Fundamental Engineering, Nippon Institute of Technology, Saitama, Japan
Materials Sciences and Applications·Volume 09 (2018)·Pages 723–731·Published 6 August 2018·DOI10.4236/msa.2018.99052
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Abstract
In this article, the authors report on the use of Radio Frequency (RF) Magnetron Sputtering combined with Plasma-Based Ion Implantation (PBII) technique to synthesize the Boron-Carbon (B-C) films. High purity of boron carbide (99.5%) disk was used as a target with an RF power of 300 W. The mixtures of Argon (Ar)-Methane (CH 4 ) ware used as reactive gas under varying CH 4 partial flow pressure at the specified range of 0 - 0.15 Pa and fixed total gas pressure and total gas flow at 0.30 Pa and 30 sccm, respectively. The effect of CH 4 flow ratio on the friction coefficient of B-C films was studied. The friction coefficient of the film depended on the concentration of B. When it was 10% or lower, the coefficient decreased to 0.2 or lower. In this concentration range of B, the specific wear rate also decreased to the order of 10 -7 mm 3 /Nm, and excellent wear resistance was displayed.
KeywordsBinary Boron-Carbon (B-C) FilmSputteringPlasma-Based Ion Implantation (PBII)Hybrid SystemBonding StructureFriction Performance
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