Electrostatic Coupling and Threshold Engineering in Low-Temperature µc-Si Double-Gate TFTs
- 1 Department of Physics and Chemistry, University Iba Der Thiam of Thies, Thies, Senegal
- 2 Department of Physics and Chemistry, University Iba Der Thiam of Thies, Thies, Senegal
- 3 Department of Physics and Chemistry, University Iba Der Thiam of Thies, Thies, Senegal
- 4 Department of Physics and Chemistry, University Iba Der Thiam of Thies, Thies, Senegal
- 5 Applied Research Unit for Renewable Energies, University of Nouakchott, Nouakchott, Mauritania
Abstract
Thin-film electronics based on microcrystalline silicon (µc-Si) is today a key platform for flexible and low-temperature applications. In this context, the double-gate architecture provides an additional electrostatic degree of freedom that enables fine tuning of the key parameters of TFTs. This work presents a comprehensive experimental and numerical study of electrostatic coupling between gates in low-temperature-processed µc-Si double-gate TFTs. The investigated devices consist of an undoped µc-Si active layer of either 30 nm or 200 nm thickness deposited by PECVD, with a bottom gate insulated by Si 3 N 4 and a top gate insulated by RF-sputtered SiO 2 . Electrical measurements show that, for thin films, the threshold voltage varies almost linearly with the top-gate bias, revealing a strong inter-interface coupling. In contrast, thick films exhibit almost no threshold modulation, due to significant volumetric screening. Moreover, a back-channel formation is observed under positive top-gate bias, consistent with mechanisms reported in the literature for multi-interface architectures. A complete numerical model was developed in SILVACO ATLAS to interpret these phenomena. The model incorporates a detailed description of µc-Si based on four exponential distributions representing band-tail states and deep defect states, in accordance with models derived for amorphous silicon. The simulations accurately reproduce the experimental curves and confirm that the penetration of the electric field from both gates through the active layer is only effective at low thickness. They also reveal that the appearance of the second channel results from electron accumulation induced by the back-gate bias. This study highlights the decisive role of active-layer thickness and defect density in the operation of µc-Si double-gate TFTs. The results open promising perspectives for the optimization of devices requiring enhanced electrostatic control, including flexible circuits, large-area sensors, and low-power electronics.
- Troccoli, M.N., Roudbari, A.J., Chuang, T. and Hatalis, M.K. (2006) Polysilicon TFT Circuits on Flexible Stainless Steel Foils. Solid - State Electronics , 50, 1080-1087. https://doi.org/10.1016/j.sse.2006.04.035
- Janfaoui, S., Kandoussi, K., Simon, C., Coulon, N., Crand, S. and Mohammed-Brahim, T. (2010) Electrical and Mechanical Behaviors of Microcrystalline TFTs Deposited on PEN. ECS Transactions , 33, 217-225. https://doi.org/10.1149/1.3481240
- Suzuki, T., Osaka, Y. and Hirose, M. (1982) Theoretical Interpretations of the Gap States in Amorphous Semiconductors. Japanese Journal of Applied Physics , 21, L159–L161.
- Liu, Y., Masahara, M., Ishii, K., Sekigawa, T., Takashima, H., Yamauchi, H., et al . (2004) A Highly Threshold Voltage-Controllable 4T FinFET with an 8.5-nm-Thick Si-Fin Channel. IEEE Electron Device Letters , 25, 510-512. https://doi.org/10.1109/led.2004.831205
- Lui, O.K.B., Quinn, M.J., Tam, S.W.B., Brown, T.M., Migliorato, P. and Ohshima, H. (1998) Investigation of the Low Field Leakage Current Mechanism in Polysilicon TFT’s. IEEE Transactions on Electron Devices , 45, 213-217. https://doi.org/10.1109/16.658833
- Samb, M.L., Jacques, E., Kandoussi, K., Belarbi, K., et al . (2012) µc-Si TFT with Very Thin Active Layer, a SOI-TFT. MRS Spring Meeting , San Francisco, 9-13 April 2012.
- Samb, M.L., Jacques, E., Kandoussi, K., Belarbi, K., Coulon, N. and Mohammed-Brahim, T. (2012) Beneficial Effect of Very Thin Active Layer on the Performance of Microcrystalline Silicon TFTs. ECS Transactions , 49, 59-67. https://doi.org/10.1149/04901.0059ecst
- Mohammed-Brahim, T. (2012) Active-Matrix Flat Panel Displays Based on Silicon Thin-Film Transistors. 2012 19 th International Workshop on Active-Matrix Flatpanel Displays and Devices , Kyoto, 4-6 July 2012.
- Choi, C.H., Kim, T., Kim, M.J., Kim, G., Oh, J.E. and Jeong, J.K. (2024) Double-Gate Structure Enabling Remote Coulomb Scattering Suppression in IGO Thin-Film Transistors. Scientific Reports , 14, Article No. 58330.
- Münzenrieder, N., Zysset, C., Petti, L., Kinkeldei, T., Salvatore, G.A. and Tröster, G. (2013) Flexible Double Gate A-IGZO TFT Fabricated on Free Standing Polyimide Foil. Solid-State Electronics , 84, 198-204. https://doi.org/10.1016/j.sse.2013.02.025
- Concas, M., Mascia, A., Lai, S., Bonfiglio, A. and Cosseddu, P. (2024) Fabrication of Flexible Double‐Gate Organic Thin Film Transistor for Tactile Applications. Advanced Materials Technologies , 9, Article 2400534. https://doi.org/10.1002/admt.202400534