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Structural Analysis of ZnO Film Deposited by Means of Metal Organic Decomposition Method
Department of Electrical and Computer Engineering, Akashi College of Technology, Akashi, Japan
Technical Education Support Center, Akashi College of Technology, Akashi, Japan
Department of Electrical and Electronic Engineering, Anan National College of Technology, Anan, Japan
Department of Electrical and Electronic Engineering, Anan National College of Technology, Anan, Japan
- 1 Department of Electrical and Computer Engineering, Akashi College of Technology, Akashi, Japan
- 2 Technical Education Support Center, Akashi College of Technology, Akashi, Japan
- 3 Department of Electrical and Electronic Engineering, Anan National College of Technology, Anan, Japan
- 4 Department of Electrical and Electronic Engineering, Anan National College of Technology, Anan, Japan
Journal of Materials Science and Chemical Engineering·Volume 02 (2014)·Pages 41–48·Published 29 October 2014·DOI10.4236/msce.2014.211006
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Abstract
ZnO films were deposited on glass substrates by means of a metal organic decomposition (MOD) method. We investigated the effect of annealing temperature, time and the number of laminated layers on the film structure on the basis of X-ray diffraction measurements. We found the optimum conditions of the temperature and the time to be 600°C and 40 minutes for the preparation, respectively. In addition, the layer-by-layer forming was not found to degrade the film from viewpoint of X-ray line width.
KeywordsZnO FilmMOD MethodTransparent ElectrodeX-Ray Analysis
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